Black-silicon production process by CF4/H2 plasma
نویسندگان
چکیده
منابع مشابه
MICROSTRUCTURAL STUDY OF SILICON NITRIDE WHISKERS PRODUCED BY NITRIDATION OF PLASMA-SPRAYED SILICON LAYERS
plasma-sprayed silicon layers have been used to produce silicon nitride layers with fibrous microstructure which optimizes fracture toughness and strength. SEM examination of the specimens shows that the surface is covered by fine needles and whiskers of Si3N4.In order to study the oxygen contamination effect as well as other contaminants introduced during spraying and nitridation processes, su...
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2016
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2016.02.008